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Banqiu Wu Benjamin Eynon Photomask Fabrication Technology (Hardback) (UK IMPORT)

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Item specifics

Condition
Brand New: A new, unread, unused book in perfect condition with no missing or damaged pages. See the ...
Book Title
Photomask Fabrication Technology
Publication Name
Photomask Fabrication Technology
Title
Photomask Fabrication Technology
Author
Banqiu Wu, Benjamin G. Eynon
Format
Hardcover
EAN
9780071445634
ISBN
9780071445634
Publisher
Mcgraw-Hill Education
Genre
Technology & Engineering
Release Date
16/08/2005
Release Year
2005
Language
English
Country/Region of Manufacture
US
Item Height
2in
Item Length
9.1in
Item Width
6in
Item Weight
32.3 Oz
Series
Professional Engineering
Publication Year
2005
Topic
Electronics / Circuits / Integrated, Telecommunications, Electronics / General
Number of Pages
500 Pages

About this product

Product Information

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product. Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

Product Identifiers

Publisher
Mcgraw-Hill Education
ISBN-10
0071445633
ISBN-13
9780071445634
eBay Product ID (ePID)
45030553

Product Key Features

Book Title
Photomask Fabrication Technology
Author
Banqiu Wu, Benjamin G. Eynon
Format
Hardcover
Language
English
Topic
Electronics / Circuits / Integrated, Telecommunications, Electronics / General
Publication Year
2005
Genre
Technology & Engineering
Number of Pages
500 Pages

Dimensions

Item Length
9.1in
Item Height
2in
Item Width
6in
Item Weight
32.3 Oz

Additional Product Features

Lc Classification Number
Tk7872.M3
Table of Content
Introduction Data Preparation and Design Pattern Generation Pattern Transfer Photomask Metrology Defect Control and Finishing Inspection, Repair, and Cleaning Resolution Enhancement Techniques Water Fabrication Issues Future Developments Appendices References
Copyright Date
2006
Lccn
2005-047886
Dewey Decimal
621.3815/31
Intended Audience
Trade
Dewey Edition
22
Illustrated
Yes

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Product is 95% alike picture but a little more blurry. Controller play well but had a notice from psn that my joypad wasn't authentic and could by problematic🤷‍♂️ no trouble so far! Shipping was fast but no tracking and worst packaging ever.. like the box came banged up... send a question to seller never had a reply 😅.... Good product overall, excellent price, fast shipping, wrapped only on 4 sides out of 6, no tracking and never reply... 4★ product / 2★ seller ✌️
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